Metal Organic Chemical Vapor Deposition (MOCVD)
Release date: 2022-01-11 Views: 282

 

Working principle: the metal organic precursor mixture solution with suitable proportion, through the peristaltic pump to the flash chamber, organic solution at the entrance of flash chamber atomized, immediately by high temperature and evaporating, into a gaseous form to the substrate, under the certain reaction temperature, and reaction gas produces chemical reaction, which grow in the substrate to form the corresponding metal compound film.

Equipment advantages:

1. The insertion loss of the superconducting filter with the superconducting surface as the ground surface is more than 30% lower than that of the traditional superconducting filter.

2. High preparation efficiency, 8 pieces 2-3inch double-sided YBCO films can be prepared at one time, and it takes only 16min on average to prepare a 500nm double-sided YBCO film.

3. Low cost, the cost of YBCO film prepared by MOCVD is only 45 yuan, which fully meets the requirements of commercial production.

Characterization methods: Scanning electron microscope(SEM) was used to analyze the microstructure of the film. Analysis of elemental composition using energy dispersive spectrometer(EDS); X-ray diffraction(XRD) was used to analyze the microstructure of the film. The critical current density of the film was measured by Jc-scan critical current density measurement system. The microwave surface resistance(Rs) of thin films was measured by sapphire dielectric resonator.

Characterizations:

1. Effects of Y, Ba and Cu contents on critical current density and microwave surface resistance

 

2. 2inch film Jc~2.4MA, microwave surface resistance below 0.5mΩ

 

3. SEM surface morphologies of YBCO

 

4. The photo of sample

 

Yudong Xia
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