Sputtering target
Release date: 2022-01-11 Views: 473

 

Background introduction: With the deepening of the application research of superconducting thin films, small-area films are gradually developing to large-area films, and the requirements for target materials are becoming more and more strict. Large-area thin films not only have higher requirements on the composition, purity and uniformity of the target material, but also require the target to be larger in volume and more complex in shape, and a new preparation process must be adopted to meet the above requirements.

The current preparation scheme: cold pressing technology is used, and a high-tonnage tablet press is used to press the target. Hot pressing technology, pressing at 850°C, 70MPa. In the follow-up, the preparation of melt-textured targets will be carried out to meet the needs of various experiments.

Simple preparation process: As shown in the figure above, the powder of YBCO is first prepared according to the ratio of 1:2:3, then the purity of the powder is improved through multiple sintering and ball milling, and finally the powder is pressed into a target material. Due to different experimental needs, the target material or wire cutting will be polished in the follow-up.

The following figure shows the powder XRD pattern of the polished YBCO target material. After many times of XRD powder diffraction tests, the purity of the target material we have prepared at present is relatively high.

 

 

优势:

1、实验仪器齐全;拥有300吨位的压片机、球磨机、鄂氏破碎机、线切割机等

2、粉末经过4次以上烧结、球磨;纯度都比较好,颗粒度大约在500~800目之间

3、烧结好靶材致密度~92%

 

Boubeche Mebrouka
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