Parameter index
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FEATURE |
DETAILS |
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Substrate |
double-side 2'' diameter standard 3'' and 4'' on request |
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PLD Chamber size |
18'' diameter Spherical chamber standard (Adjustable on request) |
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Base vaccum |
5.0×10-8 Torr standard (at room temperature) |
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Standard armored heater |
≤900°C |
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| Substrate Heating |
Advanced armored heater |
≤1100°C |
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SiC heater |
≤1600°C |
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Nd:YAG Laser (Made in China) |
Selectable wavelength including 266, 355, 532 and 1064 nm |
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Maximum Scanning Range |
60mm（Available to prepare 4’’ film） |
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Process gases |
O2, N2, Ar |
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Annealing Pressure |
≤ 1 atm |
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Target Carousel |
3×2'' diameter standard >3×2'' on request |
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Automation |
Open-source Control System based on LabVIEW |
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Features
"Large Scale" Rotary Irradiation Heaters
Non-contact radiation heating, can be reversed to prepare double-sided films.
The dense arrangement of furnace wires increases the heating load.
Resistant to pure oxygen annealing atmosphere below 1 atmosphere pressure.
Scanning sputtering enables 'large-scale' thin film deposition
Extremely simplified "straight path" with minimal loss
The overall mobile scanning of laser components ensures consistency and stability
Co-sputter deposition of three laser beams to improve efficiency
Completely open source software and hardware automation control system, support scan compensation
Product Application - Film Preparation
SrTiO3 Standard Reference Sample (2 inches)
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SrTiO3 (STO) Film on LaAlO3 substrate |
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Surface Roughness |
0.366 nm (RMS) |
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FWHM |
0.069° |
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Distribution |
Thickness ±0.9% Lattice Constant ±0.08% |
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Growth Speed |
6.7 nm/min |
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YBa2Cu3O7-x large size film quality (2 inches)
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YBa2Cu3O7-x (YBCO) Film on LaAlO3 substrate |
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Microwave Surface Resistance |
<0.24 mΩ @77 K @10 GHz |
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Critical Current Density |
~ 3.0 MA/cm2 @77 K |
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Surface Roughness |
9.66 nm (RMS) |
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Distribution |
Thickness ±0.46% |
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Growth Speed |
13 nm/min |
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